The PhD project aims at the fundamental understanding of the emission of light by dense laser-produced tin plasmas at the atomic level, and at using this understanding to push the limits of the efficiency of plasma sources of extreme ultraviolet (EUV) light for nanolithography. Which physical processes determine the efficiency of the conversion of drive laser energy into EUV power and how can this be optimized? Answering these questions by focusing on the fundamentals of atomic plasma processes, through detailed time-resolved spectroscopic investigations and advanced laser control, will pave the way for better, more efficient sources. The PhD student will be embedded in the EUV Plasma Processes team at ARCNL, but will also be actively involved in experiments at external laboratories and (industrial) facilities. This project is part of an NWO-VIDI grant titled 'New light for nanolithography'.

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, the Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also http://www.arcnl.nl
The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

You have an MSc in (applied) physics. Knowledge in the fields of laser physics, atomic and molecular physics, or vacuum technology is advantageous. Good verbal and written communication skills (in English) are required.

Fixed-term contract: four years.

When fulfilling a PhD position at NWO-I, the Institutes Organisation of NWO, you will get the status of junior scientist. You will have an employee status and can participate in all the employee benefits NWO-I offers. You will get a contract for four years. Your salary will be up to a maximum of 2,834 euro gross per month. The salary is supplemented with a holiday allowance of 8 percent and an end-of-year bonus of 8.33 percent. You are supposed to have a thesis finished at the end of your four year term with NWO-I. A training programme is part of the agreement. You and your supervisor will make up a plan for the additional education and supervising that you specifically need. This plan also defines which teaching activities you will be responsible (up to a maximum of ten percent of your time). The conditions of employment of NWO-I are laid down in the Collective Labour Agreement for Research Centres (Cao-Onderzoekinstellingen), more exclusive information is available at this website under Personeelsinformatie (in Dutch) or under Personnel (in English).
General information about working at NWO-I can be found in the English part of this website under Personnel. The 'Job interview code' applies to this position.

ARCNL

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Foundation of Scientific Research Institutes (NWO-I), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, the Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also http://www.arcnl.nl