This project aims at understanding the violent expansion into the vacuum of a hot and dense laser-produced tin plasma relevant for state-of-the-art extreme-ultraviolet nanolithography. Which plasma processes are responsible for the charge state and energy distributions of the plasma ions? How can we experimentally probe and reveal these processes? Finally, can we control the plasma expansion? Answering these questions requires unveiling the driving atomic and laser-plasma processes through detailed ion spectroscopies and advanced laser control. Identification and understanding of the processes paves the way for even better sources  for tomorrow’s nanolithography. You will be embedded in the EUV Plasma Processes team at ARCNL, where you will co-supervise a team of talented PhD students.

You need to meet the requirements for a doctors-degree and preferably have research experience in a non-Dutch academic environment. Knowledge and experience in the fields of experimental plasma, laser, and/or atomic physics is mandatory. Hands-on experience with ion spectroscopy techniques is advantageous. Good verbal and written communication skills (in English) are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of three years. ARCNL assists any new foreign postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

EUV Plasma Processes

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.  ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. 

The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.