Are you interested in simultaneously unraveling the fundamentals of friction and contributing to the solution of friction-related challenges in computer chip production?

The research field of tribology, devoted to contact formation, friction and wear phenomena down to the atomic scale, is of direct and pressing relevance to the manufacture of semiconductor devices. Friction-induced stresses and deformations on the scale of only a few atomic spacings are starting to challenge the future of nanolithography technology, limiting the achievable feature size in semiconductor chips.

In this project, you will explore and exploit the nano- and mesoscale fundamentals of frictional dissipation to design interfaces with controllable friction. In virtually all sliding interfaces, a myriad of contacting asperities collectively carry the normal force and generate friction.  But what is the nature of frictional energy dissipation at a single contact point? How does the macroscopic friction coefficient emerge from the collective behavior of many contact points? What happens if these contact points are in equilibrium with surrounding vapor? You will show that these ill-understood aspects of friction can each be used to create tunable friction. Within the project, you will be able to perform macroscopic friction experiments in controlled environments, lateral (and atomic) force microscopy as well as fluorescence microscopy and contact modeling (1-3).

You will be embedded in the Contact Dynamics team at ARCNL but will also be closely associated with the tribology teams at the University of Amsterdam and at ASML, the world leading manufacturer of high tech lithography machines for chip making. You will have the opportunity to coach and co-supervise one or more MSc and PhD students.

References:

1. B. Weber, T. Suhina, A. M. Brouwer and D. Bonn. Frictional weakening of slip interfaces. Sci. Adv. 5 eaav7603 (2019).
2. D. Petrova, B. Weber, C. Allain, P. Auderbert, D. Bonn and A. M. Brouwer. Fast 3D microscopy imaging of contacts between surfaces using a fluorescent liquid. ACS Appl. Mater. Interfaces 10, 40973−40977 (2018).
3. B. Weber, T. Suhina, T. Junge, L. Pastewka, A.M. Brouwer and D. Bonn. Molecular probes reveal deviations from Amontons’ law in multi-asperity frictional contacts. Nat. Commun. 9, 888 (2018).

You have a PhD in physics, or a related subject. You enjoy performing experiments and analysis to stepwise build a deeper understanding of complex physical mechanisms. You are good at communicating and explaining the results of your work. Experimental (and modeling) experience in the field of tribology would be advantageous.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years. 
ARCNL assists any new foreign employees with housing and visa applications and compensates their transport costs and furnishing expenses.

Contact Dynamics

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl

The research activities of the Contact Dynamics group aim at investigating and providing fundamental understanding of the mechanisms underpinning friction, friction changes over time and friction variability, as affected by wear phenomena, at forces, scales and other preconditions relevant to present and future nanolithography technology. This includes rough surface contact mechanics, adhesion, tribochemical wear, thin film lubrication and novel coatings.