This two-year postdoc project is at the interface between science and applications. Accelerated technological change in the semiconductor industry is driven by the continuous reduction of feature size. Printing the smaller and smaller patterns raises more and more challenges for the wafer metrology systems.

Coherence is among the fundamental properties of light and one of the key parameters of the light sources used for metrology: while some sources are preferred to be incoherent, others have to be fully or partially coherent. Improper spatial coherence of the illumination beam may cause severe degradation in the performance of imaging and metrology sensors. A simple multimode (MM) fiber is a very promising tool for tailoring the spatial coherence.

You will work on theoretical modeling and guide experimental investigations. You will realize advanced mode solvers for a broad variety of MM fibers that will allow to simulate light propagation in fibers with any complex core shape and/or refractive index profile function. You will analyze and test how different optical elements including MM fibers could be optimized to achieve full spatial coherence and wavefront control.

You will collaborate with other scientists at ARCNL on the experimental implementation of newly developed concepts, as well as with researchers from VU Amsterdam. The research will be done in close collaboration with ASML and SCHOTT.

You have a PhD in physics, computational physics or applied mathematics, and combine a strong theoretical foundation with an affinity for experiments and applications. You have experience in computational imaging, machine learning, modelling (optical) wave phenomena, information theory and/or optimization algorithms. Knowledge of imaging technology, advanced programming methods and/or semiconductor metrology is considered an advantage. Good verbal and written communication skills (in English) are required.

You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of two years. ARCNL assists any new foreign postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

Nanoscale Imaging and Metrology

The Nanoscale Imaging and Metrology group is a research group at ARCNL, headed by Dr. Lyuba Amitonova. The research activities aim at developing new techniques for fast and accurate characterization of 3D multi-layer nanostructures for better metrology tools.

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl