This three-year postdoc position lies at the interface between fundamental physics and industrial application and is part of a fully funded Dutch Top Knowledge and Innovation Covenant grant “Determination of the state of target matter for EUV generation: advancing metrology”.

Background
Laser-produced plasmas, generated from tin targets carefully prepared by a series of laser “pre-pulses”, provide the extreme ultraviolet (EUV) light that powers state-of-the-art nanolithography. The efficiency of generating this EUV light, and the stability and “uptime” of an EUV stepper tool, is strongly correlated with the ability to shape & control the tin target before it is hit by an energetic CO2 laser pulse. Currently, however, it is unclear how the tin target mass is spatially distributed and moreover its phase, be it liquid, gaseous, or plasma, is not known.

Project goal
In a team effort, we aim to determine and understand the phase of the tin target matter in detail as a function of various laser parameters. For this purpose, you will perform laser-induced fluorescence as well as Mie scattering studies on carefully prepared targets. Combined with high-resolution shadowgraphy technology, you will advance target metrology, enabling the full determination of the tin target mass – liquid, gas, or plasma. In collaboration with the in-house theory group, you will develop a thorough understanding of the underlying target dynamics and its equation of state. The advanced metrology will be used in tandem with ARCNL’s droplet generator setups and laser facilities, and the project is supported by the larger team of the EUV Source Department.

You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of laser, plasma, and atomic physics or a strong fluid mechanics background is advantageous. Good verbal and written communication skills (in English) are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of three years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

EUV Plasma Processes

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, housing approximately 100 scientists and support staff. See also www.arcnl.nl.

The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.