This three-year postdoc position lies at the interface between fundamental physics and industrial application and is part of a fully funded Dutch Top Knowledge and Innovation Covenant grant “Determination of the state of target matter for EUV generation: advancing metrology”.
Laser-produced plasmas, generated from tin targets carefully prepared by a series of laser “pre-pulses”, provide the extreme ultraviolet (EUV) light that powers state-of-the-art nanolithography. The efficiency of generating this EUV light, and the stability and “uptime” of an EUV stepper tool, is strongly correlated with the ability to shape & control the tin target before it is hit by an energetic CO2 laser pulse. Currently, however, it is unclear how the tin target mass is spatially distributed and moreover its phase, be it liquid, gaseous, or plasma, is not known.
In a team effort, we aim to determine and understand the phase of the tin target matter in detail as a function of various laser parameters. For this purpose, you will perform laser-induced fluorescence as well as Mie scattering studies on carefully prepared targets. Combined with high-resolution shadowgraphy technology, you will advance target metrology, enabling the full determination of the tin target mass – liquid, gas, or plasma. In collaboration with the in-house theory group, you will develop a thorough understanding of the underlying target dynamics and its equation of state. The advanced metrology will be used in tandem with ARCNL’s droplet generator setups and laser facilities, and the project is supported by the larger team of the EUV Source Department.
You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of laser, plasma, and atomic physics or a strong fluid mechanics background is advantageous. Good verbal and written communication skills (in English) are required.
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of three years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.
Dr. Oscar Versolato and Dr. John Sheil
Group leaders EUV Plasma Process & Plasma Theory and Modeling
Phone: +31 (0)20-851 7100
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Make sure to apply no later than 31 Jul 2022 23:59 (Europe/Amsterdam).
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