The postdoc will develop new concepts for computational imaging and metrology, and perform optical experiments to test such concepts, to advance the capabilities of semiconductor metrology and enable accurate characterization of nanostructures.

Computational imaging is a promising new approach for microscopy, as it has the potential to increase the performance of any imaging system beyond the limitations introduced by optical components. Computational imaging can, for example, enable (sub-)diffraction-limited performance over wide wavelength ranges, using relatively simple lenses.

As a postdoc, you will explore optical sensor concepts that use computational imaging techniques for high-resolution metrology on structures that are relevant in nanolithography. You will work on the realization of a microscope that can ultimately offer sub-nm measurement capability that is needed in future metrology systems in the semiconductor industry. Reaching this sub-nm metrology performance is highly challenging and asks for innovative and novel ideas that push the capabilities of computational imaging methods well beyond their existing boundaries. In addition to carrying-out your own research program you are also expected to coach and supervise a PhD candidate who is also working on this topic.

You will also collaborate with scientists at ARCNL who explore related topics in, for example, the area of lensless imaging. Moreover, you are also encouraged to collaborate with researchers from ASML to work towards applications of your research results in nanolithography.

You have a PhD in physics with hands-on experience in experimental (imaging) optics combined with an interest in computational imaging algorithms with metrology applications. Knowledge of (computational) imaging technology, advanced programming methods and/or semiconductor metrology is considered an advantage. Good verbal and written communication skills in English are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the VU University Amsterdam (VU) for the duration of two years. As new foreign postdoc you will be assisted with housing and visa applications and compensated for transport costs and furnishing expenses.

On full-time basis the remuneration amounts to a minimum gross monthly salary of €2.709,- and a maximum of €4.274,- in accordance with salary scale 10, depending on your education and experience. The job profile (researcher 4) is based on the university job ranking system. Additionally, the VU University Amsterdam offers excellent fringe benefits and various schemes and regulations to promote a good work/life balance, such as

• a maximum of 41 days of annual leave based on full-time employment
• 8% holiday allowance and 8.3% end-of-year bonus
• considerable employer’s contribution to the ABP pension scheme
• contribution to commuting expenses

optional model for designing a personalized benefits package 

Computational Imaging

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl

The Computational Imaging group at ARCNL has a research activity towards improving the performance of optical metrology tools with computational means. The applications of these tools are focused on semiconductor manufacturing. 

The EUV Generation and Imaging group at ARCNL has a strong research activity on lensless and computational imaging, using both visible light and EUV/soft-X-ray radiation, aimed at high-resolution imaging and metrology of nanostructures.