This PhD project is part of the ERC Starting grant EUVPLASMA.

This PhD project aims at understanding and controlling dense laser-produced plasma, to produce extreme ultraviolet (EUV) light for tomorrow’s nanolithography. In a team effort, we will answer the following question: Which atomic physics processes determine the efficiency of the conversion of drive laser energy into EUV power and what is its fundamental limit? How can we best prepare and visualize a tin-atom target to optimally interact with high-energy drive laser light? Answering these questions by focusing on experimental studies of the fundamental in-plasma atomic processes, using state-of-the-art laser systems, will enable the continuation of Moore’s law, producing ever more powerful computer chips. You will be embedded in the EUV Plasma Processes team at ARCNL, which frequently interacts with our industrial partner ASML.

You have an MSc in (applied) physics. Knowledge in the fields of experimental atomic and plasma physics, or laser physics is advantageous. Good verbal and written communication skills (in English) are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 1 year, with the intention of an extension of three years. After successful completion of the PhD research a PhD degree will be granted by the VU university Amsterdam. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

EUV Plasma Processes

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl

The research activities of the EUV Plasma Processes group aim at the understanding of the fundamental dynamics at the atomic and molecular level in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.