The Plasma Theory and Modeling group are seeking a postdoctoral researcher to develop and employ models of laser-driven tin plasmas for EUV light source applications.

Background

New-generation lithography machines employ extreme ultraviolet (EUV) radiation to print nanometer-scale features on silicon wafers for integrated circuit production. In this technology, EUV radiation is generated in a hot and dense plasma formed when intense laser radiation is focused onto liquid tin targets. A crucial aspect of EUV light source development efforts is the identification of laser parameters and target geometries which maximize EUV production in an efficient and debris-limiting manner.

Project goal

The goal of this project is to develop analytical and numerical models of laser-produced tin plasmas to support EUV light source development efforts. The ultimate aim is to identify the key physical processes underlying efficient generation of EUV radiation from laser-irradiated tin targets. Using a combination of analytical models and large-scale numerical simulations, we will identify the laser configurations and target geometries which optimize EUV source operation. You will become acquainted with numerous topics in plasma physics, such as LTE/non-LTE radiation transport, laser-plasma interaction and plasma expansion. You will also work closely with experimentalists in the EUV Plasma Processes group at ARCNL, where your models will be used to interpret experimental measurements and guide future experiments.

You need to meet the requirements for a doctors-degree and preferably have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of laser-produced plasma modeling, atomic physics processes in dense plasmas or general plasma modeling is advantageous. Good verbal and written communication skills (in English) are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Institutes Organisation of the Netherlands Organisation for Scientific Research (NWO-I) for a maximum duration of three years. ARCNL assists any new foreign postdocs with visa applications and compensates their transport costs and furnishing expenses.

Plasma Theory and Modeling

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, housing approximately 100 scientists and support staff. See also www.arcnl.nl

The Plasma Theory and Modeling group investigate the fundamental physical processes at the heart of laser-driven EUV source plasmas. Research performed by the group encompasses topics in laser-plasma interaction, atomic processes in hot plasmas, plasma expansion and laser-induced hydrodynamics of tin droplets.