Postdoc: Speckle control with computational optics

Postdoc: Speckle control with computational optics

Published Deadline Location
28 Jun 8 Nov Amsterdam

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Job description

As a postdoc, you will work on new computational imaging approaches to overcome speckle artefacts in digital holographic microscopy. These new methods will enable a more accurate characterization of nanostructures for the semiconductor industry.  

To realize future high-tech devices that are sustainable for billions of people, it is crucial to improve their optical functionalities and efficiencies. We will take a major step forward by the unique combination of freeform optics on the macro scale and wavefront shaping on the micro scale. New devices that allow the measurement of features and overlay in integrated circuit production with higher throughput.

Today’s imaging technologies generate a wealth of data that requires multi-dimensional quantitative analysis, for example, to turn microscope images into valuable metrology information. This gives rise to computational imaging, a new paradigm that optimizes optical systems together with post-processing algorithms allowing the design of instruments with a capacity far exceeding the physical limits of the optics itself. You will develop and demonstrate new computational approaches to compensate the random speckle variations in the compact metrology system based on digital holographic microscope.

You will perform this project at ARCNL in close collaboration with researchers from University of Twente and semiconductor equipment manufacturer ASML. We will work within a big team of mathematics, optics and physics researchers (ARCNL, University of Twente, TU Eindhoven, TU Delft) in close collaboration with our users (Addoptics, Anteryon, ASML, Demcon, JMO, Lumileds, Signify, TNO,) to solve these technology challenges.




We are looking for an enthusiastic candidate with a Ph.D. degree in physics or a strongly related field. A background in optics, (coherent) imaging a clear advantage. Affinity for performing optical experiments, solve mathematical problems and working as part of a team are considered important. Candidates should have experimental skills and be able to communicate in English. The project’s results will be presented on national and international conferences and in relevant journals.

Conditions of employment

The position is intended as full-time (40 hrs / week, 12 months / year) appointment in the service of the Netherlands Foundation for Scientific Research Institutes (NWO-I) for the duration of 2 years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants. ARCNL assists any new foreign researchers with housing and visa applications and compensates their transport costs and furnishing expenses.


Nanoscale Imaging and Metrology

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also


  • Postdoc
  • 1212226


Science Park 106, 1098 XG, Amsterdam

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