ARCNL PhD Talent Fellowship

Work Activities
The Advanced Research Center for Nanolithography (ARCNL) invites exceptional (top-5%) students to apply for the ARCNL PhD Talent Fellowship. This fellowship is designed to attract top students to conduct pioneering academic research directly inspired by high-tech industry.

Qualifications
We welcome highly talented and motivated candidates who:

• Have an MSc degree in (Applied) Physics or Chemistry, or a related field, or will obtain their degree within three months after the application deadline.
• Have an excellent academic record as proven by results and marks.
• Are self-driven, creative, and capable of independent research.
• Demonstrate strong analytical, experimental and/or computational skills.
• Are team players with a flexible mindset and the ability to collaborate across disciplines.

Work environment
ARCNL is a leading research institute located in Amsterdam, dedicated to advancing the fundamental physics and innovative technologies that drive semiconductor manufacturing. Our research connects ultrafast science, nanophotonics, materials physics, and plasma physics with industrial challenges relevant to next-generation lithography.

ARCNL is organized in three departments (Source, Metrology, and Materials), and the research topics include:

• High-Harmonic Generation and Ultrafast Nanophotonics
• EUV Generation and Plasma Physics
• Nanometrology and Materials Characterization
• Laser-Plasma Interaction and Source Optimization
• 3D Nanostructure Imaging and Scattering Techniques
• Surface Chemistry and Tribology

Our institute combines state-of-the-art laboratories with a dynamic scientific environment, closely connected to ASML and major Dutch academic partners.

Working conditions

• World-class equipment and research infrastructure
• An ambitious and collaborative scientific environment to accelerate your research excellence
• Competitive salary and full-time employment
• A one-year contract, which after positive evaluation is extended for three years.
• Strong links to industry (particularly ASML) and exposure to real-world high-tech challenges
• Dedicated support for your scientific career development and future academic or industrial trajectory

More information?
For further information about the position, please contact dr. Marjan Fretz: m.fretz@arcnl.nl

Application
Application Process

1. Identify your preferred research topic and ARCNL group (www.arcnl.nl) .
2. Contact the relevant group leader to discuss your initial project idea.
3. Develop your proposal in consultation with the group leader.
4. Submit the following documents:

• Curriculum Vitae, incl. contact details for 3 references
• A transcript of grades from BSc and MSc
• 1-page project proposal
• 1-page motivation letter (why this group, why ARCNL, why you, and what motivates you to carry out this research here)

Deadline: January 31, 2026
Application review procedure and timeline: If your proposal is evaluated positively, we will hold an online and an on-site interview: Online interviews: February 2026. On-site visit and interviews: March 2026. Notification of decision: late March – April 2026.

You can respond to this vacancy online via the button below.

We look forward to receiving your application and to working with the next generation of researchers shaping the future of fundamental physics for nanolithography.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

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