PhD-student: Laser scattering and spectroscopy investigations of tin vapor targets for next-generation plasma sources of EUV light for nanolithography

PhD-student: Laser scattering and spectroscopy investigations of tin vapor targets for next-generation plasma sources of EUV light for nanolithography

Published Deadline Location
9 Feb 8 Aug Amsterdam

Job description

This PhD project aims at understanding and controlling tin targets for laser-produced plasma, generating extreme ultraviolet (EUV) light for state-of-the-art nanolithography. In a team effort, in close collaboration with the ARCNL plasma theory & modelling group, we will answer the following question: What actually happens when an energetic laser pulse hits a microscopic tin droplet? What sort of particles (fragment droplets, atoms, or ions) are generated when violent phase explosions occur? How can we best prepare and visualize such tin targets to optimally interact with high-energy drive laser light? Answering these questions by focusing on experimental studies of the fundamental processes, using state-of-the-art wavelength tunable laser systems in the optical and ultraviolet to study (Mie) scattering and for performing active atomic spectroscopies, will enable the continuation of Moore’s law, producing ever more powerful computer chips. You will be embedded in the EUV Plasma Processes team at ARCNL, which frequently interacts with our industrial partner ASML.




You have an MSc in (applied) physics. Knowledge in the fields of experimental atomic, plasma, fluid physics, or laser physics is advantageous. Good verbal and written communication skills (in English) are required.

You will need to meet the requirements for an MSc-degree, to ensure eligibility for a Dutch PhD examination.

Conditions of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,441 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.


EUV Plasma Processes

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is finalizing its buildup towards a size of approximately 100 scientists and support staff. See also 

The research activities of the EUV Plasma Processes group aim at the understanding of the fundamental dynamics at the atomic and molecular level in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

Additional information

Prof.dr. Oscar Versolato and Wim Ubachs
Group leader EUV Plasma Processes
Phone: +31 (0)20-754 7100

You can respond to this vacancy online via the button below.
Please annex your:
–  Resume;
–  Motivation on why you want to join the group (max. 1 page).
It is important to us to know why you want to join our team. This means that we will only consider your application if it entails your motivation letter. on.

Applications will be evaluated on a rolling basis and as soon as an excellent match is made, the position will be filled.

Online screening may be part of the selection.

Commercial activities in response to this ad are not appreciated.


  • PhD
  • max. 40 hours per week
  • 1140856


Science Park 106, 1098 XG, Amsterdam

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Application procedure

Application procedure

Make sure to apply no later than 8 Aug 2021 10:42 (Europe/Amsterdam).