Atomic layer deposition (ALD) is a method to deposit ultra-thin films that has a vastly growing number of applications in semiconductor processing and other areas of nanotechnology. Within this field, ALD processes involving plasmas - plasma ALD processes - are becoming increasingly more common and vital for applications. This holds particularly for industrial processes as the use of plasma ALD in industry has grown much faster than expected from the academic R&D efforts. A consequence is that the associated understanding of plasma ALD processes has not increased accordingly and is limiting its further expansion.

Project description

The selected candidate will investigate the mechanisms underlying plasma ALD in an integrated approach: aspects such as plasma generation, plasma-wall interaction and plasma chemistry, as well as film growth and plasma-surface interaction will be studied to establish the relations between deposition conditions and resulting material and device properties. Unresolved fundamental questions such as those related to ion-radical synergy effects, film conformality and plasma damage will be addressed. To this end the candidate will design and set up (laser-based) diagnostics to study the plasma properties and plasma-surface interactions in close collaboration with a PhD student working within the same project. The insights obtained are expected to result in new plasma ALD processes, a wider range of ALD-materials, and novel and improved applications of ALD. Hence the research will take plasma ALD to the next level.

Location

The research will be performed in the group Plasma & Materials Processing at the Department of Applied Physics at the TU/e. The PMP group focuses on the advancement of the science and technology of plasma and materials processing, a research area which is in essence multidisciplinary and encompasses the research fields of plasma physics, surface science, and materials science. The scientific objective of the group is to obtain 'atomic' level understanding of the interaction of plasmas and gases with materials by using dedicated optical diagnostics. The project is thus at the heart of the research carried out by the group.

We welcome applications of highly talented, enthusiastic, and exceptionally motivated candidates with a doctoral degree in (Applied) Physics, Chemistry, Chemical Engineering or similar. He/she must have affinity with physical chemistry with a proven interest in plasma processing and spectroscopy. Practical experience in applying optical diagnostics, operating plasma reactors and vacuum equipment would be an asset. Good communication skills in English (both written and spoken) are required.

Responsibilities and tasks:
• Participate in the modification of the ALD reactor for plasma-surface interaction studies;
• Operate and maintain the ALD reactor as well as the laser-spectroscopic equipment;
• Coordinate and conduct experiments in the field of the proposed research;
• Preparation of progress reports, scientific papers and conference communications;
• Daily supervision of Bachelor and M.Sc. students.

We offer

a full-time appointment for a maximum of two years;

a gross monthly salary between € 3,111 and 4,084 (on a full-time basis), depending on experience and knowledge;

a holiday allowance of 8% of the yearly salary;

an end-of-year allowance of 8.3% of the annual salary;

a broad package of fringe benefits (including moving expenses and excellent sports facilities).