Photonics is widely regarded as the key enabling technology of the 21st century and its applications in many scientific and industrial fields is accelerated though Photonic Integrated Circuits (PICs), which combine many optical components into a miniaturized chip format. Similar to electronic ICs, PICs are revolutionizing areas such as healthcare, communication and sensing and have the potential to be disruptive to the whole society.
We are currently building core competences for the newly established Photonic Integration Technology Center (
PITC). The goal of PITC is to advance photonic integration technology towards industrial use. We work together with Europe's main players in the photonics industry to coordinate access to this technology, enhance existing photonic platforms and provide research and development services for companies. The technology center will work to further mature promising research results by lifting them to higher technology readiness levels (TRL), thus bridging the gap between excellent scientific output and its industrial exploitation.
The position is funded by the OIP4NWE project (
www.oip4nwe.eu), whose aim is to establish infrastructure and technical capabilities for the development of photonic integrated circuits (PICs) in an open innovation environment. In the framework of this project, a new fully automated 4' MOVPE reactor for InP is being installed in the NanoLab@TU/e, as well as other key cleanroom tools (Inductively-Coupled Plasma Reactive-Ion Etching, and Plasma-Enhanced Chemical Vapor Deposition) with automatic cassette loading for high process repeatability and robustness. These state of the art tools will contribute to lifting the TRL of PICs through precise epitaxy, etching an deposition of layers. After tools release, a process flow will be developed to integrate them with lithography projection tools and fabricate photonic devices and circuits.
We have the vision to further extend our manufacturing capabilities over the next years to create a best-in-class InP PIC pilot line infrastructure, which can be the cornerstone for joint technology developments in an open innovation setting.
Work EnvironmentThe Eindhoven University of Technology, one of Europe's top technological universities, is in the heart of one of the largest hightech innovation ecosystems. At the TU-Eindhoven we have one of the world's best equipped cleanroom laboratories for research and development of photonic integrated circuits. Our activities are characterized by a combination of academic excellence and a strong realworld impact. To this aim, we have a close collaboration with the PhotonDelta ecosystem and other external high-tech industries.
Technology development is carried out in the NanoLab@TU/e cleanroom facility of TU/e (
www.tue.nl/nanolab). Both, researchers and a number of companies work in a cooperative way in this facility. NanoLab@TU/e has a diversity of equipment and processes for deposition of various materials, including epitaxy, atomic layer deposition, optical (including an ASML DUV scanner) and electron beam lithography, and dry/wet etching techniques.
Your ResponsibilitiesYou will be expected:
- to carry out process development within the framework of current projects like OIP4NWE. In the short term, the work will be highly focused on etching and deposition process development, and shortly after you will be trained in diverse techniques (incl. lithography) to be able to carry out the processing of photonic integrated circuits.
- to be responsible for process development of certain plasma tools and maintain the processes
- to contribute in designing new process flows
- work and communicate efficiently in a research environment and proactively contribute with your own ideas and solutions
- report and document technical progress