The Advanced Research Center for Nanolithography (ARCNL) has a vacancy for  a Tenure-track group leader/Assistant professor: Contact Dynamics for Nanolithography.

At the ARCNL, you will work as tenure-track group leader in the field of contact dynamics for nanolithography. You will focus on fundamental understanding and manipulating contact, friction and wear behaviour, down to the nanometre scale, for materials and conditions appropriate to future challenges in nanolithography.

Your group will be housed at ARCNL and will collaborate with other research groups at the center. The group has access to the various facilities at ARCNL, and also at the NanoLab at our neighbour institute AMOLF and at the University of Amsterdam. Facilities include a unique bespoke confocal tribometer setup that combines visualisation of contacts between rough surfaces with simultaneous friction measurements. This is complemented by state-of-the-art facilities for surface analysis and for tribological experiments under different atmospheres and conditions. Combining these techniques enables the group to gain new, fundamental insights that advance the field of tribology and are useful for any application involving fundamental aspects of friction and wear.

The tenure-track group leader position is equivalent to that of a tenure-track assistant professor. As a tenure-track group leader you are granted a competitive start-up package for equipment and PhD students. High-level technical support will be provided by dedicated group technicians and by the technical support departments (electronic, software and mechanical) of AMOLF.

As a tenure-track group leader, you will:

• initiate a novel research program, aligned with ASML Research, on understanding and manipulating contact, friction and wear behaviour for future challenges in nanolithography;
• direct your group members and supervise the projects within the group;
• be responsible for the budget, the planning, and the quality of the projects in the group;
• publish your work in leading international journals;
• present the work at conferences and research institutes in the Netherlands and abroad;
• collaborate actively with the other research groups at ARCNL, in particular those working on materials, surfaces and thin films;
• establish and maintain an active collaboration with ASML research;
• develop and maintain external relations, both national and international;
• acquire national and international financial support to expand the group;
• contribute actively to the positioning of the field, both nationally and internationally.

You are graduated in physics, materials science and/or mechanical engineering with experience in tribology, especially at the nano-scale.

You have a special interest in at least one of the following fields:

• the origins of friction variability and (time-dependent) friction changes, as affected by wear phenomena and the generation and dynamic behaviour of wear particles;i
• nfluencing friction and wear behaviour through the use of advanced coatings, surface treatments and/or surface topographies and
• developing technologies for controlling friction on demand using a stimulus, switching between high and low friction.

The position will be filled at the level of Assistant professor (Tenure track). The tenure track agreement will initially be on a temporary basis for a period of five years with up to three assessment interviews during this period. The position will become permanent after five years at a higher level if the candidate is successful. Criteria that have to be met include success in research, funds acquisition and education. Details of the criteria will be mutually agreed upon before the appointment. Based on a full-time appointment (38 hours per week) the gross monthly starting salary will range from €3,637 to €5.656 depending on expertise and previous experience (salary scale 11 – 12). The salary will be increased by 8% holiday allowance and 8,3% end-of-year bonus. The Collective Labour Agreement (Cao) of Dutch Universities is applicable. A favourable tax agreement, the 30% ruling, may apply to non-Dutch applicants.

University of Amsterdam

With over 5,000 employees, 30,000 students and a budget of more than 600 million euros, the University of Amsterdam (UvA) is an intellectual hub within the Netherlands. Teaching and research at the UvA are conducted within seven faculties: Humanities, Social and Behavioural Sciences, Economics and Business, Law, Science, Medicine and Dentistry. Housed on four city campuses in or near the heart of Amsterdam, where disciplines come together and interact, the faculties have close links with thousands of researchers and hundreds of institutions at home and abroad.  

The UvA’s students and employees are independent thinkers, competent rebels who dare to question dogmas and aren’t satisfied with easy answers and standard solutions. To work at the UvA is to work in an independent, creative, innovative and international climate characterised by an open atmosphere and a genuine engagement with the city of Amsterdam and society.

http://www.uva.nl/en/home

Advanced Research Center for Nanolithography

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU) and the semiconductor equipment manufacturer ASML, and is currently building up towards a size of approximately 100 scientists and support staff. ARCNL is located on the Amsterdam Science Park, The Netherlands. 

http://www.arcnl.nl