Work ActivitiesThe new Short Wavelength Light Sources for EUV Metrology group at ARCNL, Amsterdam, has an opening for a
postdoctoral researcher (2-year contract).
Project Overview:You will develop new ultrafast femtosecond-to-attosecond spectroscopy techniques in the EUV/soft-X-ray spectral range using a laboratory-based high-harmonic generation (HHG) setup. This includes:
- Developing HHG-based spectroscopic and interferometric techniques to measure interface and layer properties in multilayer solids and liquids.
- Designing methods to actively tune the EUV spectrum based on interlayer geometry and composition.
- Investigating dynamical evolution at interfaces and contributing to bridging attosecond science with industrial applications.
You will
design and perform experiments,
analyze data, and
collaborate with other researchers within ARCNL and the ultrafast science community. The position also involves publishing results in peer-reviewed journals and presenting at international conferences.
QualificationsMandatory:You have (or will receive in the near future) a PhD degree in
ultrafast light-matter interaction. You enjoy performing experiments and analysis to stepwise build a deeper understanding of complex physical mechanisms. For this position, we are particularly looking for a candidate who can
combine state-of-the-art ultrafast laser optics with instrument development and building. A solid background in both
optics/optics engineering and
condensed matter physics would be ideal.
Experience in one or more of the following topics is required:
- High-harmonic generation in gas, solids, liquids or 2D materials.
- Ultrafast lasers and optics
- Condensed matter physics
- Fundamental optical processes in solids
- Attosecond and femtosecond science
- EUV and X-ray spectroscopy and interferometry
- Vacuum instrumentation
Additionally,
programming and large data handling for data analysis
(Python, MATLAB) and
very good verbal and
written communication skills in English are required.
Preferred:Preference will be given to candidates with:
- Familiarity with ML-based phase-retrieval algorithms
- Experience with facility-based experimental expertise (Free-electron laser/Synchrotron) on solids/liquids
Work environmentARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe.
www.arcnl.nlWorking conditionsThe position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 2 years, with a salary in scale 10 (
CAO-OI) and a
range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.
More information?For further information about the position, please contact Angana Mondal:
a.mondal@arcnl.nlApplicationYou can respond to this vacancy online via the button below.
Online screening may be part of the selection.Diversity codeARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
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