The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.

ARCNL’s research programme is presently formed by 8 research groups, and a large part of the research programme is devoted to physical and chemical processes crucial for nanolithography with extreme ultraviolet (EUV) light, i.e. physics at the play in generation EUV light, development of methods using EUV light for lensless imaging and surface sciences  for optics and contact dynamics.

ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is building up towards a size of approximately 100 scientists and support staff.

Are you looking for a challenging job in a multidisciplinary and international environment? ARCNL had regularly vacancies for post-docs, PhD students, technicians and internships. More information about career opportunities on the ARCNL website:


Science Park 106, 1098 XG, Amsterdam

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