This project is part of the ERC Starting Grant EUVPLASMA.

This project aims at understanding the fundamental processes driving the deformation and fragmentation of tin micro-droplet targets after laser pulse impact. How does the laser-plasma physics influence the fluid response? How can we understand and control the transition from incompressible to compressible flows? Answering these questions by focusing on the fundamentals of fluid mechanics and laser-plasma physics will pave the way for better sources for tomorrow’s nanolithography. You will be embedded in the EUV Plasma Processes team at ARCNL, where you will lead part of our team of talented PhD students and work in close collaboration with researchers from semiconductor equipment manufacturer ASML.

You need to meet the requirements for a doctors-degree. Research experience in a non-Dutch academic environment and knowledge in the fields of fluid mechanics, plasma and/or laser physics are advantageous. Good verbal and written communication skills (in English) are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for a maximum duration of three years. ARCNL assists any new foreign postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

EUV Plasma Processes

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl

The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.