PhD-student: Soft-X-ray high harmonic-generation with an optical parametric chirped-pulse amplifier for imaging and metrology

PhD-student: Soft-X-ray high harmonic-generation with an optical parametric chirped-pulse amplifier for imaging and metrology

Published Deadline Location
30 Sep 29 Mar Amsterdam

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Job description

The High-harmonic generation and EUV science group and EUV Generation and Imaging group at ARCNL, Amsterdam, have an opening for a joint four-year PhD student position.

In this project you will contribute to our ongoing investigations to develop new ultrafast femtosecond to attosecond time-scale semiconductor metrology techniques in the soft-X-ray spectral range. In particular, you will be responsible for pushing high-harmonic generation (HHG) with a novel 50-kHz multi-mJ optical parametric chirped-pulse amplifier (OPCPA) system to attain high-flux pulses with wavelengths down to 2 nm, and use these pulses for coherent imaging and metrology experiments. Ultimately the goal is to push the HHG source such that we connect these metrology and imaging measurements with pump-probe techniques, for spectroscopic imaging in the soft-X-ray range.

The project is part of a grant of the Dutch research council that helps bringing novel high-harmonic generation sources as well as imaging and spectroscopy techniques to industry.




You will need to meet the requirements for an MSc-degree, to ensure eligibility for a Dutch PhD examination. A degree in physics, physical chemistry, electrical engineering, or a closely related subject is the best fit for this project. You enjoy performing experiments and analysis to stepwise build a deeper understanding of complex physical mechanisms. For this project it is most important that you enjoy working with optics and lasers for improving and pushing the existing laser / OPCPA / HHG infrastructure. Experience in one or more of the involved topics (high-harmonic generation, optical parametric chirped pulse amplifiers, ultrafast lasers and optics, coherent diffraction imaging and wave optics, vacuum instrumentation, attosecond and femtosecond science, EUV and X-Ray spectroscopy and scattering), in particular experimentally but also theoretically, is advantageous.

Very good verbal and written communications skills (in English) are required.

Conditions of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years. After successful completion of the PhD research a PhD degree will be granted at the Vrije Univseriteit (VU) Amsterdam. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants.


High-Harmonic Generation and EUV Science

The High-harmonic generation and EUV science groups develops and utilizes new high-harmonic generation based extreme ultraviolet and soft-X-ray sources in the energy range from 10 – 600 eV for spectroscopy and metrology applications. Specific areas of interest are attosecond and femtosecond time-resolved spectroscopy of complex chemical and solid-state dynamics, new strategies for efficient high-harmonic generation, as well as new routes for nanometer-scale imaging of semiconductor structures. Novel types of attosecond and femtosecond transient absorption and reflection spectroscopies, as well as scattering techniques, are developed, and applied to fundamental question with particular relevance to nanolithography.

The group is equipped with Ti:Sa (Titanium:Sapphire) lasers for high-harmonic generation. In addition, a unique 50 kHz, multi-mJ optical-parametric chirped-pulse amplifier system ia the main driver for this project.

The EUV Generation and Imaging group at ARCNL focuses on the development and application of advanced lensless and computational imaging technology, using radiation ranging from visible light down to soft-X-ray wavelengths, with the aim to visualize and study micro- and nanoscale structures with unprecedented detail and contrast. Furthermore, we explore routes towards optimization of extreme ultraviolet light production from laser-produced plasmas, using advanced optical methods and ultrafast laser technology.

The groups house state-of-the-art lab facilities at the Advanced Research Center for Nanolithography (ARCNL). The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently housing about 100 scientists and support staff. We offer a dynamic and open environment, and aim to provide the optimum conditions for young scientists to do exciting research leading to high-impact results, which focus on fundamental physics and chemistry challenges, and might also have direct technological relevance.


  • PhD
  • 1197360


Science Park 106, 1098 XG, Amsterdam

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