As a postdoc, you will lead a multidisciplinary research project, determining the interaction of 2D materials with light, with a wavelength range from extreme ultraviolet (EUV) to infrared (IR) radiation.
The Advanced Research Center for Nanolithography (ARCNL) has an opening for a fully funded 3-year postdoc position, in collaboration with the University of Amsterdam (UvA) and the research institute AMOLF.
Materials exposed to light inevitably undergo radiation-induced changes for sufficiently high light intensities. Also 2D materials, ordered layers of single-unit-cell thickness, can be modified if a critical fluence is exceeded. Understanding and controlling the interaction of 2D materials with different wavelength regimes of light has promising applications, including nanolithography and photocatalysis. When using lasers as light sources, light-induced changes can take different forms, ranging from the generation of defects to the separation of layers from their support materials (delamination), and the direct removal of material. In this project, we investigate the light-matter interaction of 2D materials, such as transition metal dichalcogenides, to enable their industrial integration in electronic devices. We aim to identify the requirements and mechanisms of light-induced changes in 2D materials via a comprehensive approach, ranging from material preparation to high-intensity (laser) light exposure and the characterization of the light-induced modifications. For this project, we are seeking a postdoc candidate who is interested in interdisciplinary research into the fundamental interaction mechanisms of light with atomically thin layers in the context of semiconductor technology.
You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment.
You have a PhD in Physics, Physical Chemistry, or Materials Science and, preferably, experience with (femtosecond) lasers and optics.
You are independent and have good project management skills.
Good verbal and written communication skills (in English) are required.
A background in light-matter interaction, materials characterization, laser spectroscopy, 2D materials, or surface science is considered an advantage for the project.
The position is intended as full-time (40 hrs / week, 12 months / year) appointment in the service of the Netherlands Foundation for Scientific Research Institutes (NWO-I) for the duration of 3 years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants. ARCNL assists any new foreign researchers with housing and visa applications and compensates their transport costs and furnishing expenses.
You will lead a collaboration between the Light-Matter Interaction group and the Materials & Surface Science for EUVL group at ARCNL, the 2D Nanophotonics group at the Institute of Physics of the UvA, and the Resonant Nanophotonics group at AMOLF, and the semiconductor equipment manufacturing company ASML. You will study the fundamental physics behind light-induced modifications to 2D materials within the context of novel approaches for nanolithography and optical metrology. You will learn to prepare 2D layers and nanostructures for experiments, expose them to high-power laser light, and analyze the light-induced changes to the material properties. For this purpose, you will work with (tunable) femtosecond laser systems and acquire a deep understanding of light-matter interaction at high optical fluences. With the help of experts in the respective characterization method, you will study pristine and light-exposed layers with several techniques such as atomic force microscopy (AFM), optical microscopy, scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy.
Prof.dr. R. Bliem
Group leader Materials and Surface Science for EUV Lithography
Phone: +31 (0)20-754 7100
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Science Park 106, 1098 XG, Amsterdam
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Make sure to apply no later than 31 Jul 2023 23:59 (Europe/Amsterdam).
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