As a PhD student, you will develop new methods to engineer wavefront and spatial coherence of a bright laser source. You will use optical fibers and freeform optics together with methods of wavefront shaping to design new imaging and metrology tools that are relevant for future semiconductor technology.

To realize future high-tech devices that are sustainable for billions of people, it is crucial to improve their optical functionalities and efficiencies. We will take a major step forward by the unique combination of freeform optics on the macro scale and wavefront shaping on the micro scale. New devices that allow the measurement of features and overlay in integrated circuit production with higher throughput.

You will perform this project at ARCNL in close collaboration with researchers from University of Twente and semiconductor equipment manufacturer ASML. We will work within a big team of mathematics, optics and physics researchers (ARCNL, University of Twente, TU Eindhoven, TU Delft) in close collaboration with our users (Addoptics, Anteryon, ASML, Demcon, JMO, Lumileds, Signify, TNO) to solve these technology challenges.

Are you ready to take up this challenge? We are looking for an enthusiastic candidate with an MSc or equivalent degree in physics or a strongly related field. A background in optics, (coherent) imaging and/or ultrafast laser physics is a clear advantage. Affinity for performing optical experiments, solve mathematical problems and working as part of a team are considered important. Candidates should have experimental skills and be able to communicate in English. The project’s results will be presented on national and international conferences and in relevant journals. The successful candidate is expected to write a PhD thesis towards the end of the 4-year project.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,590 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted by the VU or UvA University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.
A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants.

Nanoscale Imaging and Metrology

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl