Postdoc: Machine learning for imaging and metrology

Postdoc: Machine learning for imaging and metrology

Published Deadline Location
21 Sep 19 Mar Amsterdam

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Job description

The goal of the project is to develop new machine learning frameworks for high-resolution optical imaging and metrology. You will use the new methods to image complex wafer metrology targets and to improve the precision of modern methods of alignment and overlay metrology for the semiconductor industry.

As a Postdoctoral Researcher, you will play a pivotal role in our cutting-edge research efforts, where we bridge the realms of machine learning and physics. By blending these disciplines, you will have the unique opportunity to pioneer innovative solutions and contribute to groundbreaking research with a primary focus on designing new computational imaging and metrology tools for tomorrow’s nanolithography. 

In today's rapidly evolving landscape, there is an unprecedented need for much higher resolution and high-speed imaging systems. At ARCNL, we are committed to developing innovative technologies to address these challenges. You will collaborate closely with experts in machine learning (UvA Machine learning lab) and physics (VU Amsterdam, physics department) to develop state-of-the-art computational algorithms, which lay the foundation for more accurate, high-resolution, and faster imaging and metrology systems. Our primary application fields are in high-tech and bio industries, where precision and speed are paramount. You will collaborate with different groups to implement new computational approaches in diverse experimental projects: lensless imaging with extreme ultraviolet, fiber-based endo-microscopy, and holographic dark-field microscopy.

You will perform this project together with a team of PhD students and postdocs in the Metrology department at ARCNL. You will be embedded into the Nanoscale Imaging and Metrology group and collaborate with researchers from Computational Imaging, EUV Generation and Imaging, and High Harmonic Generation and EUV Science groups. The position will involve close collaboration with researchers of the Amsterdam Machine Learning Lab of UvA and researchers at the Dutch semiconductor manufacturing equipment company ASML.




You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment.

You have a PhD in Computer Science, Artificial Intelligence, or Physics and have experience with machine learning. You have strong programming skills (Python or Matlab). You are an independent researcher and have good project management skills.
Good verbal and written communication skills (in English) are required.
A background in computational imaging and metrology is considered an advantage for the project.

Conditions of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 3 years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.


Nanoscale Imaging and Metrology

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (RuG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also 


  • Postdoc
  • 1215126


Science Park 106, 1098 XG, Amsterdam

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